Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
During use X-ray masks will receive very large accumulated doses, perhaps as high as 0.5 MJ/cm2. Because the allowed mask distortion for 0.25 μm ground rules is of the order of 0.075 μm, the permissible radiation-induced distortion is {reversed tilde equals} 0.025 μm, thus requiring substrate materials with negligible distortion when subjected to large radiation doses. The in-plane distortion of various X-ray mask substrate candidates when subjected to large accumulated doses, up to 51,000 J/cm2, is reported. © 1991.
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
Julien Autebert, Aditya Kashyap, et al.
Langmuir
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983