About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Swiss Phot. Ind. Symp. on Phot. Sens. 2024
Invited talk
Tunable and Mass-fabrication Compatible All-dielectric Metasurfaces for Mobile Sensing Applications
Abstract
A novel approach to fabricate all-dielectric metasurfaces is presented that enables upscaling to mass-fabrication levels. Despite the excellent scalability, the feature sizes of the transferred devices are well below 5 nm, enabling the metasurface's high sensitivity to dielectric changes in their environment to be used as built-in spectral feature for sensing applications with simplified read-outs.