L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
Review
Trends in patterning materials for advanced lithography
Abstract
The emerging trends in photoresists and advanced patterning materials are described, including functional fluoropolymers, molecular glasses, and imprint resists. ©2007TAPJ.
Related
Julien Autebert, Aditya Kashyap, et al.
Langmuir
C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials
Robert W. Keyes
Physical Review B