A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics
Review
Trends in patterning materials for advanced lithography
Abstract
The emerging trends in photoresists and advanced patterning materials are described, including functional fluoropolymers, molecular glasses, and imprint resists. ©2007TAPJ.
Related
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
Eloisa Bentivegna
Big Data 2022
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011