Kenneth R. Carter, Robert D. Miller, et al.
Macromolecules
Review
Trends in patterning materials for advanced lithography
Abstract
The emerging trends in photoresists and advanced patterning materials are described, including functional fluoropolymers, molecular glasses, and imprint resists. ©2007TAPJ.
Related
Conference paper
Learning Reduced Order Dynamics via Geometric Representations
Imran Nasim, Melanie Weber
SCML 2024
K.N. Tu
Materials Science and Engineering: A
A. Krol, C.J. Sher, et al.
Surface Science