E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
Review
Trends in patterning materials for advanced lithography
Abstract
The emerging trends in photoresists and advanced patterning materials are described, including functional fluoropolymers, molecular glasses, and imprint resists. ©2007TAPJ.
Related
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP