PaperFailure of Paschen's scaling law for Ne-0.1% Ar mixtures at high pressuresO. Sahni, C. LanzaJournal of Applied Physics
Conference paperAn overview of 300mm SOI starting wafer quality and its yield detractorsPei Y. Tsai, Marlene Almonte, et al.ISTFA 2005
Conference paperCharacterization of ultra thin SOI and SSOI substrates: Defect and strain analysisS.W. Bedell, H.J. Hovel, et al.ECS Meeting 2005
Conference paperEffect of the back gate conduction on 0.25 μm SOI devicesJ.L. Pelloie, D.K. Sadana, et al.IEDM 1994