Publication
IPRSN 2015
Conference paper

Thermal probe nanolithography for novel photonic devices

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Abstract

A novel alternative to E-beam lithography, in particular for plasmonic and nanophotonic devices, is presented. Patterning resolution and speed are similar; however, the novel technique enables direct 3D lithography and markerless overlay with sub-5 nm accuracy. © 2015 OSA.

Date

27 Jun 2015

Publication

IPRSN 2015

Authors

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