Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Methods for soft error rate reduction in silicon on insulator devices and circuits are explored and evaluated via simulations that have been validated against hardware measurements. Our methodology is first introduced, and the following techniques are examined in detail: 1) Body thinning, 2) carrier lifetime reduction, 3) body contacts, 4) stacked devices, and 5) parallel devices. Finally, the advantages and disadvantages of all methods are described. © 2009 IEEE.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
John G. Long, Peter C. Searson, et al.
JES
E. Burstein
Ferroelectrics
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics