Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Two techniques for determining threshold are compared to capatitance date. Errors from using 77 K thresholds are determined and the effect on measurements on NA+ doped samples estimated. © 1980, All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry