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Publication
VLSI Technology 2005
Conference paper
Stable SRAM cell design for the 32 nm node and beyond
Abstract
SRAM cell stability will be a primary concern for future technologies due to variability and decreasing power supply voltages. 6T-SRAM can be optimized for stability by choosing the cell layout, device threshold voltages, and the β ratio. 8T-SRAM, however, provides a much greater enhancement in stability by eliminating cell disturbs during a read access, thus facilitating continued technology scaling. We demonstrate the smallest 6T (0.124μm 2 half-cell) and full 8T (0.1998μm 2) cells to date.