Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A technique for collecting spatially resolved optical emission from large rf plasma reactors is described. To demonstrate the sensitivity and versatility of this technique, emission within the quartz ultraviolet, 225-253 nm, was studied with particular emphasis on the "plasma dark space." Spatial variations of CF2, AlF, and C atom emission were monitored. These results have been used for discussion and evaluation of various plasma excitation and reaction mechanisms involving atomic carbon in fluorocarbon plasmas. © 1985 Plenum Publishing Corporation.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry
A. Krol, C.J. Sher, et al.
Surface Science
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics