Single-Particle Diffusion into a Disordered Matrix: Simulation of a Metal-Polymer Interface

Abstract

A sensitive radiotracer technique has recently been utilized to examine the diffusion of copper atoms from the surface into the bulk of thin copper-deposited polyimide films upon annealing. Characteristics of the metal atom concentration profile were discussed in connection with Monte Carlo simulation studies. The present paper describes the simulation model in some detail and focuses upon the formation of metal atom clusters in the region near the film surface. Qualitative aspects of the copper atom diffusion will be shown to be consistent with the results of the Monte Carlo study. Furthermore, the dependence of metal atom cluster shape and distribution upon the interaction between the metal atoms will be examined. © 1991, American Chemical Society. All rights reserved.