X.C. Mu, S.J. Fonash, et al.
Journal of Applied Physics
A kinetic study of thermal donor formation in 450 °C heat-treated modern silicon crystals has been performed and it is concluded that SiO 3 complexes are the dominant thermal donor species (for heat-treatment times of up to about 100 h), rather than SiO4 complexes. Clusters containing a number of oxygen atoms other than three or four seem to be also electrically active.
X.C. Mu, S.J. Fonash, et al.
Journal of Applied Physics
S.W. Robey, G.S. Oehrlein
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
G.S. Oehrlein, R.M. Tromp, et al.
ECS Meeting 1983
J.D. Fehribach, R. Ghez, et al.
Applied Physics Letters