Cheng-Yen Wen, Mark C. Reuter, et al.
ECS Transactions
Using site controlled growth of single vapor-liquid-solid silicon nanowires high aspect ratio atomic force microscope probes are fabricated on a wafer scale. Nanowire probe aspect ratios as high as 90:1 are demonstrated. Probe performance and limitations are explored by imaging high aspect ratio etched silicon structures using atomic force microscopy. Silicon nanowire probes are an ideal platform for non-destructive topographic imaging of high aspect ratio features. © 2012 American Institute of Physics.
Cheng-Yen Wen, Mark C. Reuter, et al.
ECS Transactions
Yi-Chia Chou, Cheng-Yen Wen, et al.
ECS Transactions
Jeung Hun Park, Mark C. Reuter, et al.
Microscopy and Microanalysis
P.A. Bennett, David J. Smith, et al.
Nanotechnology