PaperInvestigation of Reactive-Ion-Etching-Related Fluorocarbon Film Deposition onto Silicon and a New Method for Surface Residue RemovalG.S. Oehrlein, J.G. Clabes, et al.JES
PaperStudy of near‐surface disorder and surface residues after reactive Ion etching of SiliconG.S. Oehrlein, G.J. Coyle, et al.Surface and Interface Analysis
PaperDetection Sensitivities for Thick Specimens in Proton and Electron Induced X-ray SpectrometryWilhad Reuter, Allen LurioAnalytical Chemistry
PaperSecondary Ion Emission from Metal Targets under CF3+ and O2+ BombardmentWilhad ReuterAnalytical Chemistry
