Robert W. Keyes
Physical Review B
Paper
Secondary defect formation in bonded silicon-on-insulator after boron implantation
Abstract
No abstract available.
Related
A. Reisman, M. Berkenblit, et al.
JES
Julien Autebert, Aditya Kashyap, et al.
Langmuir
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures