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Fluoropolymer platforms for 157 nm resist applications
Hiroshi Ito, G.M. Wallraff, et al.
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Paper
Resolution of the nuclear and electronic contributions to the optical nonlinearity in polysilanes
Abstract
We present a method of resolving the nuclear and electronic contributions to the third-order susceptibility χ3 in a phase conjugation experiment. The technique is applied to octylmethylpolysilane yielding χ3 (electronic)=(1.8±0.5)×10-12 esu and χ3(nuclear)=(1.1±0.4) ×10-12 esu at 532 nm.
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