R.D. Allen, R. Soortyakumaran, et al.
J. Photopolym. Sci. Tech.
We present a method of resolving the nuclear and electronic contributions to the third-order susceptibility χ3 in a phase conjugation experiment. The technique is applied to octylmethylpolysilane yielding χ3 (electronic)=(1.8±0.5)×10-12 esu and χ3(nuclear)=(1.1±0.4) ×10-12 esu at 532 nm.
R.D. Allen, R. Soortyakumaran, et al.
J. Photopolym. Sci. Tech.
G.M. Wallraff, Carl E. Larson, et al.
Proceedings of SPIE-The International Society for Optical Engineering
W.D. Hinsberg, F.A. Houle, et al.
Microlithography 2000
R.D. Allen, G.M. Wallraff, et al.
Microlithography 1995