Conference paper
Fluoropolymer platforms for 157 nm resist applications
Hiroshi Ito, G.M. Wallraff, et al.
International Conference on Microprocesses and Nanotechnology 2001
We present a method of resolving the nuclear and electronic contributions to the third-order susceptibility χ3 in a phase conjugation experiment. The technique is applied to octylmethylpolysilane yielding χ3 (electronic)=(1.8±0.5)×10-12 esu and χ3(nuclear)=(1.1±0.4) ×10-12 esu at 532 nm.
Hiroshi Ito, G.M. Wallraff, et al.
International Conference on Microprocesses and Nanotechnology 2001
G.M. Wallraff, W.D. Hinsberg, et al.
SPIE Advances in Resist Technology and Processing 1999
G.M. Wallraff, R.D. Miller, et al.
ACS Spring 1991
R.D. Allen, I.Y. Wan, et al.
J. Photopolym. Sci. Tech.