PaperAdvances in the design of organic resist materialsScott A. MacDonald, Hiroshi Ito, et al.Microelectronic Engineering
PaperA Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image ReversalScott A. MacDonald, Nicholas J. Clecak, et al.Chemistry of Materials
PaperAirborne Contamination of a Chemically Amplified Resist. 2. Effect of Polymer Film Properties on Contamination RateWilliam D. Hinsberg, Scott A. MacDonald, et al.Chemistry of Materials
PaperVariable-Temperature 13C and 29Si CPMAS NMR Studies of Poly(di-n-hexylsilane)Gian C. Gobbi, William W. Fleming, et al.JACS