Progress in 193nm resists: Impact of the development process on anhydride-containing resist materials

Abstract

The impact of develop time and developer concentration was investigated for 193nm resists based on "alternating" polymers of maleic anhydride and norbornene monomers (COMA), prepared by free radical copolymerization. The COMA materials show significant and unique performance dependence on the development process. The development process for COMA materials was found to be a powerful process variable. This paper suggests an explanation for these findings.