Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
This paper describes how authors have combined a number of tools (most of which are tailored to a particular programming language) into a single system to aid in the reading, writing, and running of programs. Discussed is the efficacy and the structure of two such systems, one of which has been used to build several large application programs.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Fan Zhang, Junwei Cao, et al.
IEEE TETC
B. Wagle
EJOR
Rolf Clauberg
IBM J. Res. Dev