Conference paperAqueous base developable deep uv resist systems based on novel monomeric and polymeric dissolution inhibitorsHiroshi ItoProceedings of SPIE 1989
PaperPositive resists based on non-polymeric macromoleculesRatnam Sooriyakumaran, Hoa Truong, et al.J. Photopolym. Sci. Tech.
PaperPoly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resinsJean M.J. Fréchet, Eva Eichler, et al.Polymer
Conference paperSilsesquioxane-based 193 nm bilayer resists: Characterization and lithographic evaluationHiroshi Ito, Hoa D. Truong, et al.Microlithography 2005