Conference paper1X deep UV lithography with chemical amplification for 1-micron DRAM productionJohn G. Maltabcs, Steven J. Holmes, et al.Microlithography 1990
Conference paperDeveloping chemical amplification resists for semiconductor device fabrication by microlithographyHiroshi ItoSPSJ Annual Meeting 2005
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PaperRadical Copolymerization of 2-Trifluoromethylacrylic Monomers. III. Kinetics and Monomer Reactivities in the Copolymerization of t-Butyl 2-Trifluoromethylacrylate and Methacrylate with Styrene Bearing HexafluoroisopropanolHiroshi Ito, Masaki Okazaki, et al.J Polym Sci Part A
