William Hinsberg, Seok-Won Lee, et al.
Proceedings of SPIE - The International Society for Optical Engineering
Paper
Preparation of lithographic resist materials by anionic polymerization
Related
Azalia A. Krasnoperova, Scott Hector, et al.
J. Photopolym. Sci. Tech.
Hiroshi Ito
SPIE Advanced Lithography 2008
Conference paper
Vinyl ether resist system for UV-cured nanoimprint lithography
Hiroshi Ito, Frances A. Houle, et al.
SPIE Advanced Lithography 2006