Conference paper
Surface processes in plasma-assisted etching
J.W. Coburn
Symposium on Process Physics and Modeling in Semiconductor Technology 1990
The plasma-assisted etching of magnetron-sputtered polycrystalline tungsten films in CF4-H2 and CF4-O2 glow discharges has been studied as a function of ion energy using quartz-crystal microbalance methods supplemented by vacuum-transfer Auger electron spectroscopy and actinometric emission spectroscopy.
J.W. Coburn
Symposium on Process Physics and Modeling in Semiconductor Technology 1990
J.W. Coburn
Journal of Applied Physics
J.W. Coburn, E.W. Eckstein, et al.
Journal of Applied Physics
E.-A. Knabbe, J.W. Coburn, et al.
Surface Science