Conference paper
Soft x-ray diffraction of striated muscle
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
The mechanistic and parametric complexity of a plasma etching environment often causes confusion and delays in the development of a suitable plasma etching process. This paper is an attempt to alleviate this problem by discussing some of the important physical and chemical phenomena and, where possible, relating these phenomena to apparatus selection and operation. © 1982 Plenum Publishing Corporation.
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
T. Schneider, E. Stoll
Physical Review B