Publication
Plasma Chemistry and Plasma Processing
Paper

Plasma-assisted etching

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Abstract

The mechanistic and parametric complexity of a plasma etching environment often causes confusion and delays in the development of a suitable plasma etching process. This paper is an attempt to alleviate this problem by discussing some of the important physical and chemical phenomena and, where possible, relating these phenomena to apparatus selection and operation. © 1982 Plenum Publishing Corporation.

Date

01 Mar 1982

Publication

Plasma Chemistry and Plasma Processing

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