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Publication
Nanotechnology
Paper
Patterning sub-10 nm line patterns from a block copolymer hybrid
Abstract
We report the formation and directed self-assembly of sub-10 nm half-pitch line patterns from lamellar microdomains of a block copolymer hybrid. The hybrid, which is a mixture of poly(styrene-b-ethylene oxide) (PS-b-PEO) and a low molecular weight organosilicate (OS), shows strong segregation between two phases (i.e. PS and PEO+OS) and forms lamellar microdomains of down to approximately 7 nm in half-pitch. Patterns applicable to multifinger device layouts are created by self-assembling the hybrid on topographic pre-patterns with a chemically non-selective surface. With careful design of the guiding topographic pattern geometry, well-controlled lateral placement including bent structures of lamellar microdomains can be obtained by this approach. © IOP Publishing Ltd.