Publication
Applied Physics Letters
Paper

Organic conductors as electron beam resist materials

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Abstract

Conducting organic π-donor halide complexes such as tetrathiafulvalene bromide were discovered to act as electron beam resists, which display a unique combination of useful properties. Exposure of sublimed films to an electron beam generates the neutral π donor and the halogen which is subsequently lost from the film. Depending on exposure conditions, either negative (solvent developed) or positive (in-situ developed) resist images with a resolution of the order of 0.5 μ can be generated. The strongly absorbing (UV,vis.) and highly conducting (∼10/Ω cm) films were found to become transmitting and insulating upon electron beam irradiation.

Date

01 Dec 1982

Publication

Applied Physics Letters

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