About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
ICSICT 2006
Conference paper
On the connection of SRAM cell stability with switching history in partially depleted SOI technology
Abstract
Read and write operational margins for SRAM cells in Partially Depleted Silicon on Insulator (PD-SOI) technology are studied. In both simulation and concept, cell stability is shown to be directly connected to the inverter nFET first switch/ second switch history, thus linking SRAM margins to a PD-SOI parameter that can be measured and monitored. © 2006 IEEE.