Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
In this paper we consider a semidefinite programming (SDP) problem in which the objective function depends linearly on a scalar parameter. We study the properties of the optimal objective function value as a function of that parameter and extend the concept of the optimal partition and its range in linear programming to SDP. We also consider an approach to sensitivity analysis in SDP and the extension of our results to an SDP problem with a parametric right-hand side. © 1999 Elsevier Science B.V. and IMACS. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Vladimir Yanovski, Israel A. Wagner, et al.
Ann. Math. Artif. Intell.
Jonathan Ashley, Brian Marcus, et al.
Ergodic Theory and Dynamical Systems
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997