Publication
Physics Letters A
Paper

Nonthermal pulsed laser annealing of Si; plasma annealing

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Abstract

In the accompanying paper we have given evidence that pulsed laser annealing of Si does not involve normal thermal melting and recrystallization. Here we argue the importance of the electron-hole plasma produced by the laser to the annealing process. © 1979.

Date

10 Dec 1979

Publication

Physics Letters A

Authors

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