About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
Journal of Applied Physics
Paper
Nonperturbative ion etching of YBaCuO thin films
Abstract
Conventional Ar ion etching deteriorates the features of YBaCuO superconducting thin films, because of heating and ion damage. We demonstrate here the interest of two other approaches: Ar ion etching with liquid nitrogen cooling and Xe ion etching.