Conference paper
High speed device testing and internal node diagnostics
George Chiu, Jean-Marc Halbout, et al.
Microlithography 1987
This paper presents waveform measurements at the internal nodes of a 0.5-μm CMOS SRAM, performed at room temperature and at low temperature (80 K). These measurements yield detailed information on the internal operation of the circuit, and, more precisely, on the delays whose sum constitutes the access time in this highspeed memory circuit. The waveforms are measured in a noncontact, nonintrusive fashion with a newly developed ultrafast electron beam prober, the Picosecond Photoelectron Scanning Electron Microscope (PPSEM). © 1988 IEEE.
George Chiu, Jean-Marc Halbout, et al.
Microlithography 1987
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IEEE T-MTT
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ASSL 1989
G.V. Treyz, P.G. May, et al.
Applied Physics Letters