Modal Dispersion and Attenuation Measurements of Silicon Nitride and Silicon Oxynitride Waveguides Using a Streak Camera

Paul May; S. Basu; George L.-T. Chiu; G. Arjavalingam

doi:10.1109/50.47876

Journal of Lightwave Technology

Paper

01 Jan 1990

Modal Dispersion and Attenuation Measurements of Silicon Nitride and Silicon Oxynitride Waveguides Using a Streak Camera

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Abstract

Attenuation and dispersion characteristics for different modes of dielectric waveguides fabricated on silicon have been characterized by measuring the propagation of short pulses using a synchroscan streak camera. © 1990, IEEE

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Abstract

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