Eloisa Bentivegna
Big Data 2022
The performance of devices and circuits is advancing at a rapid pace with submicron design ground rules. The requirements to probe the internal nodes of these ultra-fast, -small, and -dense circuits give rise to great challenges for high speed electron-beam testing. In this paper, we review the development of electron beam testing to achieve simultaneously: 5 ps temporal resolution, 0.1 μm spot size and 3mV/√Hz voltage sensitivity. The newly developed instrument, called the Picosecond Photoelectron Scanning Electron Microscope (PPSEM), is capable of measuring the state-of-the-art bipolar, FET circuits and wiring delays. © 1989.
Eloisa Bentivegna
Big Data 2022
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Imran Nasim, Melanie Weber
SCML 2024
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics