Julien Autebert, Aditya Kashyap, et al.
Langmuir
During the last half century, a dramatic downscaling of electronics has taken place, a miniaturization that the industry expects to continue for at least a decade. We present efforts to use the self-assembly of one-dimensional semiconductor nanowires1 in order to bring new, high-performance nanowire devices as an add-on to mainstream Si technology. The nanowire approach offers a coaxial gate-dielectric-channel geometry that is ideal for further downscaling and electrostatic control, as well as heterostructure-based devices on Si wafers. © 2006 Elsevier Ltd. All rights reserved.
Julien Autebert, Aditya Kashyap, et al.
Langmuir
Hiroshi Ito, Reinhold Schwalm
JES
U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures
H.D. Dulman, R.H. Pantell, et al.
Physical Review B