Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
A report on the progress in nanofabrication technology was presented. The principles and limits of the various pattern formation techniques which have emerged as important tools in the research nanoscale devices and structures were discussed. Topics such as electron beam lithography, imprint lithography, proximal probes and self assembly were also discussed.
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering