Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
No abstract available.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Robert F. Gordon, Edward A. MacNair, et al.
WSC 1985
Michael E. Henderson
International Journal of Bifurcation and Chaos in Applied Sciences and Engineering
Ronen Feldman, Martin Charles Golumbic
Ann. Math. Artif. Intell.