Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
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SPIE Advanced Lithography 2007
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Simeon Furrer, Dirk Dahlhaus
ISIT 2005
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009