American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Conference paper

01 Mar 1998

Microlithographic applications of silicon-containing polymers and individual organosilicon compounds

Paper

A comparison of the E-beam and UV-sensitivities and relative O₂- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups

E. Babich, J.M. Shaw, et al.

Microelectronic Engineering

Paper

SUMMARY ABSTRACT: CHARACTERISTICS OF ORGANOSILICON POLYMERS IMMERSED IN GASEOUS PLASMAS.

J. Paraszczak, E. Babich, et al.

Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

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A comparison of the E-beam sensitivities and relative O₂-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers

E. Babich, J. Paraszczak, et al.

Microelectronic Engineering

Paper

X-ray photoelectron and infrared spectroscopy of microwave plasma etched polyimide surfaces

N.J. Chou, J. Paraszczak, et al.

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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