Ellen J. Yoffa, David Adler
Physical Review B
A production-worthy deep UV resist system built on the ESCAP platform is described. The resist consists of a thermally and hydrolytically stable resin and acid generator and thus can be heated at high temperatures for free volume reduction, which provides stabilization toward airborne base contamination. The film densification in conjunction with the use of a bulky acid reduces acid diffusion during postexposure bake, contributing to high lithographic performance. Robust 0.25 Jim process latitudes have been demonstrated. Furthermore, the resist has produced excellent 175 nm line/space images with a depth-of-focus of 0.3 u,m on a KrF excimer laser stepper with a numerical aperture of 0.60, indicating that the resist allows the use of the current exposure tool in the early 1 Gbit generation. 01996 TAPJ.
Ellen J. Yoffa, David Adler
Physical Review B
G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
Eloisa Bentivegna
Big Data 2022
J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications