Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Laser cleaning of wafer surfaces and lithography masks
Abstract
Laser cleaning was demonstrated to be a new, promising approach to efficiently remove particulate contamination of micron and submicron size from wafer surfaces as well as from the surface and trenches of thin silicon membrane stencil masks as used for e-beam projection lithography. © 1991.
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