LASER-ASSISTED CHEMICAL ETCHING OF INORGANIC MATERIALS: MECHANISTIC STUDIES.

Abstract

We have examined the basic surface processes involved in laser-assisted chemical etching of metal and semiconductor materials, with emphasis on aspects related to photon-stimulated desorption and the important role played by photodesorption in surface etching reactions. Specifically, we have studied three solid systems which represent three different classes of surface interactions and laser etching behavior. Experimental techniques such as XPS, conventional as well as laser-induced thermal desorption, time-resolved mass spectrometry and quartz-crystal-microbalance measurements in conjection with three uv, visible and infrared laser systems are employed.