Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
Paper
Summary Abstract: Surface processes in plasma-assisted etching environments
Abstract
No abstract available.
Related
P. Alnot, D.J. Auerbach, et al.
Surface Science
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.