Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Programs encounter increasingly complex and fragile mappings to computing platforms, resulting in performance characteristics that are often mysterious to students, practitioners, and even researchers. We discuss some steps toward an experimental methodology that demands and provides a deep understanding of complete systems, the necessary instrumentation and tools to support such a methodology, and a curriculum that teaches the methodology and tools as a fundamental part of the discipline. © 2008 ACM.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Thomas M. Cover
IEEE Trans. Inf. Theory
Raymond F. Boyce, Donald D. Chamberlin, et al.
CACM
Rolf Clauberg
IBM J. Res. Dev