Hae-Jeong Lee, Christopher L. Soles, et al.
Chemistry of Materials
The dynamics of thin films photoresists polymers and incoherent neutron scattering were discussed. The elastic incoherent neutron scattering is used to parametrize changes in the atomic/molecular mobility in lithographic polymers. Results showed that a reduced Debye-Waller factor mean-square atomic displacement in thin model resist films corresponds to a decrease in the reaction front propagation kinetics.
Hae-Jeong Lee, Christopher L. Soles, et al.
Chemistry of Materials
Wen-Li Wu, Eric K. Lin, et al.
Journal of Applied Physics
Joseph L. Lenhart, Daniel A. Fischer, et al.
Langmuir
Eric K. Lin, Wen-li Wu, et al.
Proceedings of SPIE - The International Society for Optical Engineering