About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Paper
In situ buried GaInAs/InP quantum dot arrays by selective area metalorganic vapor phase epitaxy
Abstract
Using metalorganic vapor phase epitaxy to grow GaInAs/InP layers on masked InP substrates patterned with submicron square holes, we have fabricated in situ buried quantum dot arrays for the first time. Starting with mask openings ≥150 nm × 150 nm and utilizing the natural crystal habits to form low-index plane facetted pyramids inside the holes, <m1;&40q>highly regular GaInAs quantum dots embedded in InP are obtained in a single growth step. <m1;&40q>As verified by cathodoluminescence, the dots exhibit very high luminescence efficiencies, even at room temperature, owing to the absence of air-exposed or etch-damaged heterointerfaces.