R.W. Gammon, E. Courtens, et al.
Physical Review B
In this paper we discuss the properties of amorphous hydrogenated silicon and germanium films prepared by homogeneous chemical vapor deposition. Emphasis is placed upon the important differences between HOMOCVD and plasma-deposited films. Experiments and calculations are presented which illustrate the most important reactor dynamical parameters. © 1983.
R.W. Gammon, E. Courtens, et al.
Physical Review B
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MRS Spring Meeting 1999
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