Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020
In this paper we discuss the properties of amorphous hydrogenated silicon and germanium films prepared by homogeneous chemical vapor deposition. Emphasis is placed upon the important differences between HOMOCVD and plasma-deposited films. Experiments and calculations are presented which illustrate the most important reactor dynamical parameters. © 1983.
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020
J.C. Marinace
JES
Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry
R. Ghez, M.B. Small
JES