Publication
VLSI Technology 2023
Workshop paper

High-NA EUV Exposure Tool Implications to Chip and Mask Layouts

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Abstract

High-NA EUV exposure tool implications: The anamorphic nature of the high NA EUV (4x magnification in X and 8x magnification in Y) results in a field size exactly half that on current EUV and optical tools. When using high-NA tools in a semiconductor build that will also use full field tools, there are overlay implications and chip and mask layout issues that need to be optimized.

Date

11 Jun 2023

Publication

VLSI Technology 2023

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