Ying Zhang, Gottlieb S. Oehrlein, et al.
Journal of Applied Physics
Paper
Grazing angle optical emission interferometry for end-point detection
Abstract
Light emitted from a plasma during reactive ion etching and reflected by the wafer surface at a grazing angle is utilized to determine the remaining film thickness with an accuracy of ±30 Å. This promises a more flexible etching approach, e.g., tailoring the final stage of etching to minimize lattice damage.
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