Conference paper
A 26 ps self-aligned epitaxial silicon base bipolar technology
J.H. Comfort, P.F. Lu, et al.
VLSI Technology 1990
Several techniques have been proposed to determine the channel length and series resistance of MOSFET's. Numerical simulations show that these algorithms must carefully account for two-dimensional geometry effects in order to extract parameters which are physically meaningful. New techniques which take these effects into account are proposed for extracting the channel length and series resistance. © 1985 IEEE
J.H. Comfort, P.F. Lu, et al.
VLSI Technology 1990
D.K. Sadana, A. Acovic, et al.
IEDM 1992
J.N. Burghartz, J.D. Cressler, et al.
ESSDERC 1991
G. Shahidi, J. Warnock, et al.
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