E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
Hydrogen-related defects and oxygen vacancies in silica are analyzed using first-principles density-functional calculations. Energetics, structures, charge-state levels, and hyperfine parameters are determined. These calculations identify the hydrogen bridge related to the E41 center as the defect responsible for the stress-induced leakage current, a forerunner of dielectric breakdown of gate oxides in transistors.
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
Kigook Song, Robert D. Miller, et al.
Macromolecules
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films