Film modification by low energy ion bombardment during deposition

Abstract

Concurrent energetic particle bombardment can have a significant effect on the properties of evaporated and sputter-deposited films. However, in many experiments, particularly those using ion beam sputtering, the magnitude of the energetic bombardment by neutrals is ignored or underestimated. The effects of energetic bombardment include significant physical changes in the crystal sizes and orientations, defect densities, electrical and optical properties, chemical stoichiometry and surface morphologies. While there exists no general model for the effect of energetic bombardment on growing film properties, in a range of experiments researchers have started to explore systematically the interrelations of the various physical and chemical effects. These results will be helpful in elucidating what phenomena are relevant in any particular experimental system. © 1989.