Intensive optimization of masks and sources for 22nm lithography
Alan E. Rosenbluth, David O. Melville, et al.
SPIE Advanced Lithography 2009
We analyze the extension of depth of field using both amplitude and phase modulation of the pupil function. In particular, we discuss the advantages and disadvantages of each approach and establish the range of applicability of each method based on the range of spatial frequencies of interest in the imaging system. To the best of our knowledge, this is the first such report on the range of applicability of amplitude and phase modulation to extend the depth of field. © 2008 Optical Society of America.
Alan E. Rosenbluth, David O. Melville, et al.
SPIE Advanced Lithography 2009
Zahra Kavehvash, Khashayar Mehrany, et al.
Proceedings of SPIE - The International Society for Optical Engineering 2011
Saeed Bagheri
COSI 2009
Saeed Bagheri, Daniel V. Oppenheim
SRII 2011