J. Angilello, J.E.E. Baglin, et al.
Journal of Electronic Materials
The reliability of molten KOH for revealing dislocations intersecting {100} faces of GaAs has been tested using transmission x-ray topography. It is found to be a "faithful" etch.
J. Angilello, J.E.E. Baglin, et al.
Journal of Electronic Materials
M.S. Goorsky, T.F. Kuech, et al.
Applied Physics Letters
S. Mader, A.E. Blakeslee, et al.
Journal of Applied Physics
E.A. Giess, R.L. Sandstrom, et al.
IBM J. Res. Dev