PaperEffective generation of compressed stationary Gaussian fieldsRobert Manson Sawko, Malgorzata ZimonSIAM/ASA JUQ
PaperA remark on an algorithm for best Lp approximationCharles MicchelliJournal of Approximation Theory
Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004